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MR8000​

Photomask Repair System​

This FPD photomask defect repair system uses focused ion beam (FIB) technology and supports large scale photomasks.
A rotation mechanism inside the chamber minimizes an installation area.​

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  • Features
  • Resources

◙ Supports large flat panel dispray masks

◙ Can take large photomasks up to a maximum size of 1400 × 1600 mm.

◙ Can deposit high adhesion film

◙ Can form film with adhesion strength comparable to Cr film on the mask using a special gas.

◙ Can repair gray tone masks

◙ FIB carbon deposition function allows repair of clear defects in gray-tone masks that use half-tone films.

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